Sputtering Targets

Physical vapour deposition (PVD) is a process in which a material under vacuum environment is vaporized from a solid source. The vapour is transported from its source to the substrate and undergoes condensation on the substrate to form a thin film. The thickness of the film deposited ranges from a few nanometers to a few micrometers, with typical deposition rate 1-10 nm/s.

The technology generally used for manufacturing of sputtering targets we provide is vacuum melting and hot pressed sintering. The final targets produced have characteristics of high purity, high density, low gas content and uniform internal structure. They are manufactured in various dimensions.

Pure Metal Sputtering Targets

Pure metal sputtering targets are available in both planar and rotary forms. They are manufactured from a wide range of metal elements from the periodic table, offered in various dimensions and high-purity grades.

Symbol	Purity	Shape
Ti	2N7, 3N5, 4N, 4N5, 5N	Planar, Rotary
W	3N5	Planar, Rotary
Cr	2N5, 2N7, 2N8, 3N, 3N5	Planar, Rotary, Cathode
Al	4N, 5N, 5N5, 6N	Planar, Rotary, Cathode
Ni	3N, 3N5, 4N, 4N5, 5N	Planar, Rotary
Cu	3N5, 4N, 4N5, 5N, 6N	Planar
Co	3N5, 5N	Planar
Fe	3N, 3N5, 4N	Planar, Rotary
V	3N, 3N5	Planar
Zn	3N5, 4N, 5N	Planar
Sn	4N, 5N	Planar, Rotary
Mo	3N5	Planar, Rotary
Ta	3N5, 4N, 4N5, 5N	Planar, Rotary

Symbol	Purity	Shape
Nb	3N, 3N5	Planar, Rotary
B	3N	Planar
Bi	4N, 5N	Planar
Be	2N	Planar
In	4N, 5N	Planar
Pb	4N	Planar
Mn	3N	Planar
Pd	3N5	Planar
Ru	3N5	Planar
Si	4N, 5N, 6N	Planar, Rotary
Se	4N, 5N	Planar
Zr	2N4, 3N5	Planar, Rotary
Ge	5N, 6N	Planar

Alloy Sputtering Targets

We provide sputtering targets of various alloys in high purity, planar or rotary and in various dimensions. Customized production is the matter of course.

Symbol	Purity	Shape
AlTi	2N8, 3N	Planar
AlCr	2N8, 3N	Planar
AlSi	4N, 5N	Planar
AlSc	3N, 4N	Planar
AlCu	4N, 5N	Planar
AlNd	3N, 4N	Planar
CeGd	3N	Planar
CoTaZr	3N, 3N5	Planar
CoFeB	3N	Planar
CoCr	3N, 3N5	Planar

Symbol	Purity	Shape
Cu+Ni+Ti	3N, 4N	Planar
Cu+Ni	3N, 3N5, 4N	Planar, Rotary
Fe+Mn	3N	Planar
Fe+Cr	3N	Planar
Ni+V	3N, 3N5	Planar
Ni+Fe	3N, 3N5	Planar
Ni+Cu	3N	Planar
Ni+Cr	2N5, 3N, 3N5	Planar
Ni+V	3N, 3N5	Planar
WTi	3N5, 4N, 4N5	Planar

Rare Earth Sputtering Targets

Rare earth materials have excellent magnetic, electrical and optical properties and this is the reason why sputtering targets made of them are widely used. High-tech industries like electronics, optics, semiconductor device fabrication and others are typical application fields for the usage of rare earth materials.

Symbol	Purity	Shape
Sc	3N, 4N	Planar
Y	3N, 4N	Planar
Ce	3N	Planar
Dy	3N	Planar
Er	3N	Planar

Symbol	Purity	Shape
Gd	3N	Planar
Ho	3N	Planar
Lu	3N	Planar
Nd	3N	Planar
Yb	3N, 4N	Planar

Ceramic Sputtering Targets

Available are oxide and non-oxide ceramic sputtering targets. For the fragile materials like ceramics we offer indium bonding and elastomer bonding on copper backing plate. We highly recommend to order already bonded targets to avoid risk of cracking when bonding it by yourself.

Symbol	Purity	Shape
AZO	3N5, 4N	Planar
AlN	2N5	Planar
Al2O3	4N	Planar
B4C	2N5	Planar
BN	2N5	Planar
BaTiO3	3N	Planar
CeO2	3N, 4N	Planar
HfO2	3N, 4N	Planar
IGZO	4N	Planar
ITO	4N	Planar
In2O3	3N, 4N	Planar
LiNbO3	3N5, 4N	Planar
LiCoO2	3N	Planar
LiMn2O4	3N	Planar
LiCoO2	3N5, 4N	Planar
MoS2	3N	Planar

Symbol	Purity	Shape
MgO	3N5, 4N	Planar
MoO3	3N	Planar
NiO	3N5, 4N	Planar
Nb2O5	4N	Planar
Si3N4	2N5	Planar
SiO2	4N, 4N5	Planar
SiO	4N	Planar
SiC	2N5	Planar
SiO2	4N, 4N5	Planar
TiO2, TiOx	3N5, 4N	Planar, Rotary
Ta2O5	4N	Planar
SrTiO2	4N	Planar
Y2O3	4N	Planar
AZO-ZnO/Al2O3	4N	Planar
ZrO2	4N	Planar
ZnO	3N5	Planar, Rotary

Customized Sputtering Targets

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